Influence of oxygen pressure on structural and optical properties of Al2O3 optical waveguides prepared by pulsed laser deposition |
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| Authors: | A. Pillonnet C. Garapon C. Champeaux C. Bovier R. Brenier H. Jaffrezic J. Mugnier |
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| Affiliation: | (1) Thin Film Materials Research Center, Korea Institute of Science and Technology, Seoul, 136-791, South Korea;(2) Department of Materials Science and Engineering, Yonsei University, Seoul, 120-749, South Korea; |
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| Abstract: | Pure and europium doped alumina waveguides have been prepared by Pulsed Laser Deposition using a KrF excimer laser at oxygen pressures in the range from 10-7 to 0.1 mbar. The composition of the films and the doping ion concentration were determined by Rutherford Backscattering Spectroscopy. From X-ray diffraction measurements, a progressive growth of %-Al2O3 crystallites is observed as the oxygen pressure decreases. After annealing treatment, the alumina films are constituted of !-Al2O3 crystallites while europium doped alumina films remain constituted of %-Al2O3 crystallites. The films have optical waveguiding properties. The mean refractive index of the film increases as oxygen pressure decreases. |
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