A formula for the background in TXRF as a function of the incidence angle and substrate material |
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| Institution: | 1. Research Center for Computer-aided Drug Discovery, Shenzhen Institute of Advanced Technology, Chinese Academy of Sciences, Shenzhen 518055, China;2. Faculty of Pharmaceutical Sciences, Shenzhen Institute of Advanced Technology, Chinese Academy of Sciences, Shenzhen 518055, China;3. University of Chinese Academy of Sciences, Beijing 100049, China;4. Center for Human Tissues and Organs Degeneration, Shenzhen Institute of Advanced Technology, Chinese Academy of Sciences, Shenzhen 518055, China;1. Department of Chemistry, University of Girona, C/M.Aurèlia Capmany 69, 17003 Girona, Spain;2. Bioenergy and Catalysis Laboratory, Paul Scherrer Institut, 5232 Villigen PSI, Switzerland |
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| Abstract: | A simple formula has been developed that allows the calculation of the background contributed by the substrate in TXRF both exactly and in absolute terms. The scattered X-radiation from any surface is described as a function of the incidence angle and of the X-ray cross sections for scattering and total absorption of the substrate material. The formula has been confirmed experimentally for silicon, acryl and gold. Measured and calculated values agree within reasonable limits. The deviations between predicted and measured data decrease with increasing angle of incidence from up to 20% in the low angle regime down to a few percent beyond the critical angle of total reflection as a result of the decreasing influence of surface roughness. |
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