Field emissions of graphene films deposited on different substrates by CVD system |
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| Authors: | Wang Xiao-Ping Liu Xiao-Fei Liu Xin-Xin Wang Li-Jun Yang Can Jing Long-Wei Li Song-Kun and Pan Xiu-Fang |
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| Institution: | College of Science, University of Shanghai for Science and Technology, Shanghai 200093, China |
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| Abstract: | Graphene films are deposited on copper(Cu) and aluminum(Al) substrates,respectively,by using a microwave plasma chemical vapour deposition technique.Furthermore,these graphene films are characterized by a field emission type scanning electron microscope(FE-SEM),Raman spectra,and field emission(FE) I-V measurements.It is found that the surface morphologies of the films deposited on Cu and Al substrates are different:the field emission property of graphene film deposited on the Cu substrate is better than that on the Al substrate,and the lowest turn-on field of 2.4 V/μm is obtained for graphene film deposited on the Cu substrate.The macroscopic areas of the graphene samples are all above 400 mm~2. |
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| Keywords: | graphene chemical vapour deposition field emission |
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