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Plasmonic multilayer structure for ultrathin amorphous silicon film photovoltaic cell |
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| Authors: | Chien-Chang Chao Chih-Ming Wang Yia-Chung Chang Jenq-Yang Chang |
| Institution: | (1) Department of Optics and Photonics, National Central University, Jhongli, 32001, Taiwan, R.O.C.;(2) Institute of Opto-electronic Engineering, National Dong Hwa University, Hualien, 97401, Taiwan, R.O.C.;(3) Research Center for Applied Sciences, Academia Sinica, Taipei, 11529, Taiwan, R.O.C. |
| Abstract: | A plasmonic multilayer structure (PMS) is proposed for photovoltaic cells with an ultrathin active layer that is 30 nm amorphous Si (α-Si). The optical properties of the PMS are analyzed by rigorous coupled-wave analysis (RCWA) and finite-difference time-domain (FDTD) method. Using the PMS, the incident light can be trapped into localized surface plasmon (LSP) and then the localized surface plasmon induces the surface plasmon (SP) that propagates transversely within the α-Si layer. Compared with the indium tin oxide (ITO)/α-Si/Ag structure, the photon number absorbed by PMS increase 28.7% while a normal incident transverse magnetic (TM) polarization wave is applied. |
| Keywords: | plasmonic multilayer amorphous silicon photovoltaic surface plasmons |
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