Broad excitation of Er luminescence in Er-doped HfO2 films |
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Authors: | J Z Wang Z Q Shi Y Shi L Pu L J Pan R Zhang Y D Zheng Z S Tao and F Lu |
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Institution: | (1) Department of Physics and Key Laboratory of Photonic and Electronic Materials, Nanjing University, Nanjing, 210093, China;(2) Department of Physics, Fudan University, Shanghai, 200433, China |
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Abstract: | We investigated the broad and sensitized luminescence properties of Er-doped HfO2 films synthesized by pulsed laser deposition (PLD) and ion implantation techniques. In the investigation we focused on the
mechanism of energy transfer in the host matrix. Based on the comparison of photoluminescence (PL), photoluminescence excitation
(PLE), and cathode-luminescence (CL), as well as on microstructure measurements, an excitation transfer process resulting
in the broad excitation for Er, luminescence at 1540 nm, is identified. In this process, the oxygen vacancies and Hf in the
host HfO2 serve mainly as effective sensitizers for neighboring Er ions in the nonresonant excitation process. Furthermore, the direct
Er3+ intra-4f transitions and full spectral emission of Er ions in the HfO2 matrix are clearly observed under the wide-spectrum excitation in the CL measurement. This reveals more detailed features
for the energy transfer and transition processes. |
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Keywords: | PACS" target="_blank">PACS 78 20 -e 77 55 +f 78 60 HK |
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