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减少光学元件亚表面缺陷的方法研究
引用本文:项震,赵亚洲,侯晶,葛剑虹. 减少光学元件亚表面缺陷的方法研究[J]. 光子学报, 2009, 38(5): 1226-1230
作者姓名:项震  赵亚洲  侯晶  葛剑虹
作者单位:浙江大学,现代光学仪器国家重点实验室,杭州,310027  
摘    要:针对强激光光学元件的应用要求,对光学材料在研磨和抛光过程中形成的亚表面缺陷进行了分析,并借鉴小工具数控抛光和Marangoni界面效应,提出采用数控化学刻蚀技术来实现光学表面面形和微结构形貌的高准确度加工.通过实验对亚表面缺陷的分布位置和特性进行了分析,实验验证了在静止和移动条件下Marangoni界面效应的存在.对材料的定量去除进行了实验,提出了亚表面缺陷的去除方法.

关 键 词:化学刻蚀  Marangoni界面效应  亚表面缺陷  抛光
收稿时间:2006-11-30
修稿时间:2008-08-19

Subsurface Damage Structure and Eliminating
XIANG Zhen,ZHAO Ya-zhou,HOU Jing,GE Jianhong. Subsurface Damage Structure and Eliminating[J]. Acta Photonica Sinica, 2009, 38(5): 1226-1230
Authors:XIANG Zhen  ZHAO Ya-zhou  HOU Jing  GE Jianhong
Affiliation:(State Key Laboratory of Modern Optical Instrumentation,Zhejiang University,Hangzhou 310027,China)
Abstract:The subsurface damage formed in grinding and polishing process of optical elments were analyzed in application of optical elements in high power last system.Based on CNC with small tool technology and Marangoni interface effect,a new computer controlled chemical etching method was proposed which can overcome and eliminate subsurface damage to achieve high precision machining of optical surface shape and microstructure form.The distributing position and characteristics of subsurface damage were analyzd,and the existence of Marangoni effects in immobile was validated and locomotive condition was carried out.And,the experiments were carried through to quantitatively wipe off material.It shows that the subsurface damage can been eliminated effectively.
Keywords:Chemical etching  Marangoni interface effect  Subsurface damage  Polishing
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