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三端双向负阻晶体管的二维数值模拟及分析
引用本文:莫太山,张世林,郭维廉,梁惠来,毛陆虹,郑云光. 三端双向负阻晶体管的二维数值模拟及分析[J]. 微电子学, 2004, 34(6): 614-617,623
作者姓名:莫太山  张世林  郭维廉  梁惠来  毛陆虹  郑云光
作者单位:天津大学,电子信息工程学院,微电子系,天津,300072
基金项目:国家重点基础研究973资助项目(2002CB311905)
摘    要:对双向负阻晶体管(BNRT)的三端特性进行了数值模拟,得到了器件S型负阻曲线。根据BNRT不同工作状态下的内部电势、电子浓度和空穴浓度分布,解释了其S型负阻特性的产生机理。模拟分析了负阻曲线随控制电压变化的情况。结果表明,随控制电压的增大,转折电压、转折电流和维持电压均增大。最后,对不同结构和工艺参数的三端BNRT进行了模拟,总结出器件结构和工艺参数对负阻特性的影响。

关 键 词:三端双向负阻晶体管 二维数值模拟 S型负阻
文章编号:1004-3365(2004)06-0614-04

2-D Numerical Simulation and Analysis of 3-Terminal Bidirectional Negative Resistance Transistor
MO Tai-shan,ZHANG Shi-lin,GUO Wei-lian,LIANG Hui-lai,MAO Lu-hong,ZHENG Yun-guang. 2-D Numerical Simulation and Analysis of 3-Terminal Bidirectional Negative Resistance Transistor[J]. Microelectronics, 2004, 34(6): 614-617,623
Authors:MO Tai-shan  ZHANG Shi-lin  GUO Wei-lian  LIANG Hui-lai  MAO Lu-hong  ZHENG Yun-guang
Abstract:3-terminal characteristics of the bidirectional negative resistance transistor (BNRT) are numerically simulated and the S-type negative resistance curve is obtained. According to the distribution of potential, electron and hole in the BNRT at different stages, the mechanism inducing S-type negative resistance characteristics is explained. Also, the variation of negative resistance curve with controlled voltage is simulated. Results indicate that snapback voltage, snapback current and sustaining voltage increase with controlled voltage. Finally, 3-terminal BNRT with different structure and process parameters is simulated, and the influence of device structure and process parameters upon negative characteristics is summarized.
Keywords:3-terminal BNRT  Numerical simulation  S-type negative resistance
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