Aryltriazene photopolymer thin films as sacrificial release layers for laser-assisted forward transfer systems: study of photoablative decomposition and transfer behavior |
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Authors: | Matthias Nagel Romain Fardel Pascal Feurer Mark Häberli Frank A. Nüesch Thomas Lippert Alexander Wokaun |
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Affiliation: | (1) Empa, Swiss Federal Laboratories for Materials Testing and Research, Laboratory for Functional Polymers, überlandstrasse 129, 8600 Dübendorf, Switzerland;(2) Paul Scherrer Institut, General Energy Research Department, 5232 Villigen PSI, Switzerland |
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Abstract: | Thin films of a tailor-made photodecomposible aryltriazene polymer were applied in a modified laser-induced forward transfer (LIFT) process as sacrificial release layers. The photopolymer film acts as an intermediate energy-absorbing dynamic release layer (DRL) that decomposes efficiently into small volatile fragments upon UV laser irradiation. A fast-expanding pressure jet is generated which is used to propel an overlying transfer material from the source target onto a receiver. This DRL-assisted laser direct-write process allows the precise deposition of intact material pixels with micrometer resolution and by single laser pulses. Triazene-based photopolymer DRL donor systems were studied to derive optimum conditions for film thickness and laser fluences necessary for a defined transfer process at the emission wavelength of a XeCl excimer laser (308 nm). Photoablation, surface detachment, delamination and transfer behavior of aryltriazene polymer films with a thickness from 25 nm to ∼400 nm were investigated in order to improve the process control parameters for the fabrication of functional thin-film devices of microdeposited heat- and UV-sensitive materials. |
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Keywords: | KeywordHeading" >PACS 52.38.Mf 42.62.-b 81.15.Fg 85.40.Hp |
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