Fabrication of self-ordered nanohole arrays on Si by localized anodization and subsequent chemical etching |
| |
Authors: | Hidetaka Asoh Akihiko Oide Sachiko Ono |
| |
Affiliation: | Department of Applied Chemistry, Kogakuin University, 1-24-2 Nishi-shinjuku, Shinjuku-ku, Tokyo 163-8677, Japan |
| |
Abstract: | Nanohole arrays with a 60 nm hole periodicity were fabricated on a Si substrate by the anodization of an aluminum film sputtered on a Si substrate in sulfuric acid and subsequent chemical etching. The transfer of the nanoporous pattern of anodic alumina into the Si substrate was achieved by the selective removal of silicon oxide, which was produced by the anodic oxidation of the underlying Si substrate through the anodic porous alumina used as a mask. |
| |
Keywords: | Anodization Anodic porous alumina Nanopatterning Chemical etching |
本文献已被 ScienceDirect 等数据库收录! |