An electron diffraction study of the molecular structure of hexamethyldisiloxane |
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| Authors: | B Csákvári Zs Wagner P Gömöry FC Mijlhoff B Rozsondai I Hargittai |
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| Institution: | Department of General and Inorganic Chemistry, Eötvös Loránd University, Muzeum krt. 6–8, H-1088 Budapest Hungary;Gorlaeus Laboratoria der Rijksuniversiteit, Leiden The Netherlands;Central Research Institute for Chemistry, Hungarian Academy of Sciences, Puskin utca 11–13, H-1088 Budapest Hungary |
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| Abstract: | An electron diffraction determination of the molecular geometry of hexamethyldisiloxane has removed much of the uncertainty concerning this structure. The length of the SiO bond and the SiOSi bond angle were determined to be 1.631 ± 0.003 Å and 148 ± 3°, respectively. The experimental data are consistent with a staggered conformation (C2v symmetry) while a model with twist angles around the SiO bonds of about 30° cannot be excluded. The molecule is probably performing large amplitude intramolecular motion. |
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| Keywords: | Address correspondence to these authors |
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