Quantitative thickness determination using x‐ray fluorescence: application to multiple layers

The fundamental parameter method using x‐ray fluorescence was applied to the quantitative determination of single and multiple layer thicknesses using a compact experimental setup. Focused white‐beam radiation was obtained from a high‐voltage Mo x‐ray tube and the fluorescence spectra were acquired using a Peltier‐cooled Si solid‐state detector. The results show that in the case of single layers the accuracy of the thicknesses obtained is very good whereas for multiple layer structures the agreement is poorer, especially for the thinnest layers. This indicates a possible drawback of the standard‐free thickness determination scheme based on fundamental parameters for complex samples. Copyright © 2004 John Wiley & Sons, Ltd.