EPMA mapping method for small particles of Al3Fe,Al6Fe, α‐AlFeSi and β‐AlFeSi in 1050‐H18 aluminum sheets

We developed an EPMA mapping method for small Al_aFe_bSi_c particles in 1050‐H18 aluminum sheet, which is one of the base materials coated by photoresist in advance called PS plate (pre‐sensitized printing plate). In this method, we used the ratios of relative x‐ray intensities, I_Fe/I_Al and I_Fe/I_Si instead of the mass ratios, Fe/Al and Fe/Si, of the main elements which constitute the particles and tried to determine the ratios of relative x‐ray intensities using Monte Carlo calculations. Furthermore, using this developed mapping method, we performed the mapping of small Al_aFe_bSi_c particles such as Al₃Fe (0–3%Si as impurities), Al₆Fe (0–1%Si as impurities), α‐AlFeSi(Al_8.3Fe₂Si) and β‐AlFeSi(Al_8.9Fe₂Si₂) in 1050‐H18 aluminum sheets. We found that the discrimination of these particles was achieved with this mapping method. We confirmed that this method is useful for the mapping of Al_aFe_bSi_c particles in 1050‐H18 aluminum sheets. Copyright © 2004 John Wiley & Sons, Ltd.