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Substrate temperature dependence of SiH concentration in silane plasmas for amorphous silicon film deposition
Affiliation:1. Opening Project of Key Laboratory of Deep Mine Construction, Henan Polytechnic University, Jiaozuo 454000, PR China;2. School of Civil Engineering, Henan Polytechnic University, Jiaozuo 454000, PR China;3. Department of Civil Engineering & Materials Science, University of Limerick, Limerick V94 N8PY, Ireland;1. Prokhorov General Physics Institute of the Russian Academy of Sciences, Vavilov str. 38, Moscow, 119991, Russia;2. Harbin Institute of Technology, 92 Xidazhi Str, 150001, Harbin, PR China;3. V. A. Kotel''nikov Institute of Radio Engineering and Electronics of the Russian Academy of Sciences, Fryazino, 141120, Russia
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