Influence of thermal diffusion on the laser ablation of thin polymer films |
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Authors: | R. Fardel M. Nagel T. Lippert F. Nüesch A. Wokaun B.S. Luk’yanchuk |
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Affiliation: | (1) Laboratory for Functional Polymers, Empa, Swiss Federal Laboratories for Materials Testing and Research, überlandstrasse 129, 8600 Dübendorf, Switzerland;(2) General Energy Research Department, Paul Scherrer Institut, 5232 Villigen PSI, Switzerland;(3) Data Storage Institute, Agency for Science, Technology and Research, DSI Building 5, Engineering Drive 1, Singapore, 117608, Singapore |
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Abstract: | The laser ablation of a photosensitive triazene polymer was investigated with a ns XeCl excimer laser over a broad range of thicknesses (10–400 nm). We found that the ablation threshold fluence increased dramatically with decreasing film thickness for films thinner than 50 nm. Ablation on substrates with different thermal properties (sapphire, fused silica, PMMA) was investigated as well, and a clear influence of the substrate material was obtained. A mathematical model combining thermal diffusion and absorption effects was used to explain the experimental data. The model is in good agreement with the experimental data and shows that heat diffusion into the substrate plays a crucial role for the ablation process of very thin films. PACS 52.38.Mf; 44.05.+e; 81.05.Lg |
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