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Electrical and optical analyses of Er-doped silicon grown by liquid-phase epitaxy
Authors:A Cavallini  B Fraboni  S Pizzini  S Binetti  L Lazzarini and G Salviati
Institution:

a INFM and Dipartimento di Fisica, Universita' di Bologna, Viale Berti Pichat 6/2, I-40137 Bologna, Italy

b INFM and Dipartimento di Scienza dei Materiali, Universita' di Milano, via Cozzi 53, I-20126 Milano, Italy

c MASPEC-CNR, Via Chiavari 18/A, I-43100 Parma, Italy

Abstract:We have studied the deep levels present in Er-doped silicon epilayers grown by the liquid-phase epitaxy method by deep level transient spectroscopy (DLTS) and optical DLTS, in order to identify the majority and minority carrier traps and a possible correlation between these traps and the observed photoluminescence (PL) and cathodoluminescence (CL) spectra. Capacitance–voltage analyses have been performed to analyze uniformity and depth distribution of the existing traps and marked differences have been observed between the luminescent and non-luminescent materials.The PL and depth resolved CL revealed the presence of dislocation-related emission lines which can possibly be correlated to the broadened peaks observed in DLTS analyses of luminescent material.
Keywords:Erbium  Silicon  Deep level  Dislocation
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