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Cd1-xZnxTe晶体退火条件的选择及Zn压对退火晶体质量的影响
引用本文:李宇杰,张晓娜,介万奇. Cd1-xZnxTe晶体退火条件的选择及Zn压对退火晶体质量的影响[J]. 物理学报, 2001, 50(12): 2327-2334
作者姓名:李宇杰  张晓娜  介万奇
作者单位:西北工业大学凝固技术国家重点实验室,西安710072
基金项目:国家杰出青年基金(批准号:59825109);国家自然科学基金(批准号:59982006)资助的课题.
摘    要:采用传统Bridgman方法和加入accelerated crucible rotation technique的Bridgman(缩写为ACRT-B)方法生长的Cd1-xZnxTe(x=0.04)晶体中存在有点缺陷、位错、杂质和Te沉淀等缺陷.为了减少甚至消除这些缺陷,必须将生长后的CdZnTe晶片在Cd气氛下退火.从Cd-Te和Cd0.96Zn0.04Te的PT相图出发,详细讨论了CdZnTe晶体的气固平衡条件,并关键词:1-xZnxTe')" href="#">Cd1-xZnxTe退火气-固平衡

关 键 词:Cd1-xZnxTe  退火  气-固平衡
收稿时间:2001-06-01

EFFECTS OF ANNEALING CONDITIONS ON THE CRYSTALLIZATION QUALITIES OF Cd1-xZnxTe SLICES
LI YU-JIE-,ZHANG XIAO-NA and JIE WAN-QI. EFFECTS OF ANNEALING CONDITIONS ON THE CRYSTALLIZATION QUALITIES OF Cd1-xZnxTe SLICES[J]. Acta Physica Sinica, 2001, 50(12): 2327-2334
Authors:LI YU-JIE-  ZHANG XIAO-NA  JIE WAN-QI
Abstract:Defects such as point defects, dislocations, impurities and Te precipitates always exist in Cd 1-xZnxTe ( x =0.04) crystals obtained by Bridgman and accelerated crucible rotation technique-Bridgman bulk crystal growth methods. It is important to anneal CdZnTe slices in Cd vapor to eliminate these defects. In this paper, the solid-vapor equilibrium for CdZnTe crystals is first discussed extensively based on the phase diagrams of Cd-Te and the P-T plot of Cd0.96Zn0.04Te. Through the annalysis, the annealing conditions for Cd1-xZnxTe crystals are optimized. Experimental results show that the Zn partial vapor pressure, which is higher than the equilibrium pressure within a certain range, can enhance the diffusion process of the excess Te towards the surface of the slices and thus eliminate Te precipitates. However, saturated Zn pressure causes Zn and Te concentration in surface layers of the slices far away from the stoichiometry. Intensive exchange of atoms between the slice surface and the vapor under this condition would lead to severe damage to the crystallization quality on the surface. The inter diffusion of Zn also inhibits the outer-diffusion of impurities during annealing. Thus a lower Zn partial pressure, but still lies in the solid vapor equilibrium area of the P-T plot, can help to drive out the impurities. According to the crystallization quality and the concentration distribution of slices annealed under different conditions, the annealing of CdZnTe wafers is classified into three kinds, namely de-precipitate annealing, de-impurity annealing and homogenizing annealing. The favorable annealing process should be a multi-step and multi period procedure.
Keywords:Cd1-xZnxTe   annealing   solid vapor equilibrium
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