SiO2固态电解质中的质子特性对氧化物双电层薄膜晶体管性能的影响

本文采用等离子体增强化学气相沉积技术(PECVD)在室温条件下制备了具有双电层效应的二氧化硅(SiO₂) 固体电解质薄膜, 并以此SiO₂薄膜作为栅介质制备了氧化铟锌(IZO)双电层薄膜晶体管. 本文系统地研究了SiO₂固体电解质中的质子特性对双电层薄膜晶体管性能的影响, 研究结果表明, 经过纯水浸泡的SiO₂固体电解质薄膜可以诱导出较多的可迁移质子, 因此表现出较大的双电层电容. 由于SiO₂固体电解质薄膜具有质子迁移特性, 晶体管的转移特性曲线呈现出逆时针方向的洄滞现象, 并且这一洄滞效应随着栅极电压扫描速率的增加而增大. 进一步对薄膜晶体管的偏压稳定性进行测试, 发现晶体管的阈值电压的变化遵循了拉升指数函数(stretched exponential function)关系.

Effects of protons within SiO2 solid-state electrolyte on performances of oxide electric-double-layer thin film transistor

SiO₂-based solid state electrolyte films are deposited at room temperature by using the plasma-enhanced chemical vapor deposition (PECVD) technique. An electric-double-layer (EDL) effect has been observed. Then, indium-zinc-oxide thin-film transistors (IZO TFTs) are fabricated by using such SiO₂ films as dielectrics in a self-assembling process through a shadow mask. The IZO films for source/drain electrodes and channel are deposited on the nanogranular SiO₂ film by RF sputtering the IZO target in an Ar ambient. Such TFTs exhibit a good performance at an ultralow operation voltage of 1.5 V, with a high field-effect mobility of 11.9 cm²/Vs, a small subthreshold swing of 94.5 mV/decade, and a large current on-off ratio of 7.14×10⁶. Effects of protons in the SiO₂-based solid state electrolyte films on the electrical performances of the IZO TFTs are also studied. It is observed that a big EDL capacitance can be obtained for SiO₂ films dipped in pure water, as a result of the fact that there are more protons in such SiO₂ films. Because of the migration of protons in SiO₂ electrolytes, an anti-clockwise hysteresis is observed on the transfer curve. Moreover, a bigger hysteresis is observed at a higher gate voltage scan rate. Gate bias stressing stabilities are also studied the shifts in threshold voltage are observed to obey a stretched exponential function.