Electron scattering characteristics of polycrystalline metal transition films by in-situ electrical resistance measurements |
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Authors: | I.G. Trindade,D. Leitã o,Y. Pogorelev,J.B. Sousa |
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Affiliation: | a Faculdade de Ciências da Universidade do Porto, Physics Department, Rua do Campo Alegre 687, 4169-007 Porto, Portugal b IFIMUP and IN, Rua do Campo Alegre 687, 4169-007 Porto, Portugal c Instituto de Microelectronica de Madrid, Isaac Newton 8, 28760 Tres Cantos, Madrid, Spain |
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Abstract: | In-situ electrical resistance measurements were performed to obtain the scattering characteristics of very thin polycrystalline metal transition magnetic alloys grown by ion beam deposition (IBD) on specific underlayers. The experimental curves show size effects at small film thicknesses and important differences between Co85Fe15 and Ni81Fe19 thin layers grown on identical underlayers of Ta70 Å/Ru13 Å. The largest difference was observed in Ni81Fe19 films grown on underlayers of amorphous Ta70 Å. The experimental curves of electrical resistivity/conductivity variation with layer thickness were well fit within the Mayadas and Shatzkes (M-S) model, assuming specific formulations for grain growth with layer thickness. |
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Keywords: | In-situ resistance Electron scattering Magnetic alloy Ion beam deposition Polycrystalline film |
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