| 均匀沉淀法制备陶瓷金属化层的微观结构研究 |
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| 引用本文： | 郝俊杰,王建军,陈敏,郭志猛.均匀沉淀法制备陶瓷金属化层的微观结构研究[J].真空电子技术,2010(4):5-8,13. |
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| 作者姓名： | 郝俊杰 王建军 陈敏 郭志猛 |
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| 作者单位： | 北京科技大学材料科学院粉末冶金研究所,北京100083 |
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| 摘 要： | 利用均匀沉淀法制备了混合均匀并且钼粉粒度达到纳米级的陶瓷金属化粉末,使用该粉末进行了陶瓷金属化层制备,获得了比较理想的陶瓷金属化层显微结构。同时研究了Mo的含量及烧结温度对陶瓷金属化层显微结构的影响,并将该工艺生产的制品与国内现有制品的微观结构进行了对比。
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| 关 键 词： | 陶瓷金属化 均匀沉淀法 显微结构 |
Study on the Microstructure of Ceramic Metallization Prepared by Homogeneous Precipitation Process |
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| HAO Jun-jie,WANG Jian-jun,CHEN Min,GUO Zhi-meng.Study on the Microstructure of Ceramic Metallization Prepared by Homogeneous Precipitation Process[J].Vacuum Electronics,2010(4):5-8,13. |
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| Authors: | HAO Jun-jie WANG Jian-jun CHEN Min GUO Zhi-meng |
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| Institution: | (School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083,China) |
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| Abstract: | A rapid and homogeneous precipitation process was employed. The ceramic metallizing powers gained by this method were well-distributed and the average size of Mo powders is about lOOnm. The results showed that the perfect microstructure of ceramic metallizing layer could be obtained by this process. The effect of sintering temperature and Mo content on the microstructure of ceramic metallizing layer was also studied. |
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| Keywords: | Ceramic metallizing Homogeneous precipitation process Microstructure |
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