SIMS investigations on the growth mechanisms of protective chromia and alumina surface scales |
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Authors: | Horst Beske Willem J Quadakkers Horst Holzbrecher Hans Schuster Hubertus Nickel |
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Institution: | (1) Zentralabteilung für Chemische Analysen, Forschungszentrum Jülich GmbH, P. O. Box 1913, D-5170 Jülich, Federal Republic of Germany;(2) Institut für Reaktorwerkstoffe, Forschungszentrum Jülich GmbH, P. O. Box 1913, D-5170 Jülich, Federal Republic of Germany |
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Abstract: | The oxidation behaviour of the oxide-dispersion strengthened (ODS) high-temperature alloys MA 956 (an aluminium oxide former) and MA 754 (a chromium oxide former) has been compared with that of two model alloys, Fe-20Cr-5Al and Ni-25Cr. The morphology and composition of the oxide scales were investigated by metallography, X-ray diffraction analysis and scanning electron microscopy. For analysis of the oxide layer growth mechanisms, twostage oxidation experiments with18O as tracer were used, the distribution of the oxygen isotopes in the oxide scale being determined by SIMS. The ODS alloys show a more selective oxidation than the two model alloys; moreover, the protective oxides on the ODS alloys have a lower growth rate and better adhesion than those on the two model alloys. From the SIMS investigations it can be deduced that the improved properties of the layers on the ODS alloys result from a change in the transport processes in the protective layer; whereas the aluminium and chromium oxide films on the conventional alloys grow by cation and anion transport, the scales on the ODS alloys grow almost exclusively by anion transport. It is shown that the observed properties of the oxide scales on the ODS alloys can be explained by this change in transport mechanism.Dedicated to Professor Günther Tölg on the occasion of his 60th birthday |
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Keywords: | ODS alloys growth mechanism oxide scales SIMS oxygen-tracer |
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