Application of an atmospheric-pressure microwave plasma to the optical fiber manufacturing process

An atmospheric-pressure CVD method is described that uses microwave plasma for manufacturing preforms that are used in the production of optical fibers for telecommunication. The method takes advantage of the very high deposition efficiency and high deposition rates attained when using microwave plasma as well as of efficient glassing of oxide layers by means of the traditional system of burners. A simple theoretical model that allows calculations of close-to-reality plasma temperature profiles is presented.