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以低价态钛氧化物制备TiO2薄膜研究
引用本文:郭爱云,薛亦渝,朱选敏,胡小峰. 以低价态钛氧化物制备TiO2薄膜研究[J]. 真空电子技术, 2005, 0(6): 47-50
作者姓名:郭爱云  薛亦渝  朱选敏  胡小峰
作者单位:武汉理工大学,材料科学与工程学院,湖北,武汉,430070
摘    要:试验以Ti2O3,Ti3O5和TiO2作为初始膜料,在ZZS700-6/G型真空镀膜机上采用O2-离子束辅助蒸发制备氧化钛薄膜.用XRD检测方法确定各种膜料和薄膜的相成分,并全面地分析了各种膜料的蒸发特性和薄膜;用分光光度计测量薄膜的透射率,并分析薄膜的光学性能.试验表明,在采用Ti2O3,Ti3O5和TiO2作为蒸发制备氧化钛薄膜时,钛的氧化物中存在Ti3O5固态同一蒸发相;各种膜料在蒸发时,发生分解,熔池中的物质成分逐渐转变成同一蒸发相成分,最终完全转变成同一蒸发相.

关 键 词:氧化钛薄膜  蒸发镀膜  同一蒸发相
文章编号:1002-8935(2005)06-0047-04
收稿时间:2005-05-23
修稿时间:2005-09-23

Prepared TiO2 Thin Film Using Ti Sub-Oxide as Origin Materials
GUO Ai-yun,XUE Yi-yu,ZHU Xuan-min,HU Xiao-feng. Prepared TiO2 Thin Film Using Ti Sub-Oxide as Origin Materials[J]. Vacuum Electronics, 2005, 0(6): 47-50
Authors:GUO Ai-yun  XUE Yi-yu  ZHU Xuan-min  HU Xiao-feng
Affiliation:School of Materials Science and Engineering, WuHan University of Technology, WuHan 430070, China
Abstract:TiO2 thin films were prepared with Ti2O3 , Ti3O5 and TiO2 as origin materials by electron-beam e-vaporation deposition using O2- ion beam (O2 purity up to 99.99%) as auxiliary means. X-ray diffraction (XRD) was used to investigate the phase composition of different film materials, the thin films and their evaporation characteristics. In order to analyze the optical properties, the transmittances of thin films were measured by spectrophotometer. Test results showed that there are the congruent solid evaporation phases of Ti3O5 in the Ti-O system during the thin film evaporation process.
Keywords:Ti2O3  Ti3O5  TiO2
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