Influence of the Texture of Woven Materials on Their Etching Rate in Oxygen Plasma

The oxygen glow-discharge plasma treatment of a poly(ethylene terephthalate) film and fabric differing in their specific surface area was studied. The rates of mass loss, oxygen uptake, and gas evolution were measured over the discharge current and pressure ranges 20–110 mA and 50–200 Pa, respectively, at a sample temperature of 357 K. The specific etching and product formation rates calculated with accounting for the total surface area of fabric samples were shown to be not affected by the texture of studied materials.