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Structure and optical damage resistance of near-stoichiometric Zn:Fe:LiNbO3 crystals |
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| Authors: | Fu Ri Ling Zhi Hong He Jian Quan Yao Baio Wang Shao Ji Jiang |
| Institution: | aWuhan National Laboratory for Optoelectronics, School of Optoelectronics Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, PR China bInstitute of Optoelectronic and Composite Materials, School of Physics and Engineering, Sun Yat-sen University, Guangzhou 510275, PR China |
| Abstract: | A series of near-stoichiometric Zn:Fe:LiNbO3 crystals were grown by the high-temperature top-seed solution growth (HTTSSG) method from stoichiometric melts doped with 6 mol% K2O. Infrared (IR) transmission spectra were measured and discussed in terms of the defect structure of the near-stoichiometric Zn:Fe:LiNbO3 crystals. The results of the transmitted beam pattern distortion method show that the optical damage resistance of the near-stoichiometric Zn:Fe:LiNbO3 crystals increases rapidly when the ZnO concentration exceeds a threshold value. The threshold value concentration of ZnO of the near-stoichiometric Zn:Fe:LiNbO3 crystals is much lower than that of the congruent LiNbO3 crystals. The dependence of the optical damage resistance on the defect structure of the near-stoichiometric Zn:Fe:LiNbO3 crystals are discussed, and the holographic recording properties of the near-stoichiometric Zn:Fe:LiNbO3 crystals are investigated. |
| Keywords: | Stoichiometric Optical damage resistance Zn:Fe:LiNbO3 crystals |
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