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Capturing properties of a threefold coordinated silicon atom in silicon nitride: Positive correlation energy model
Authors:V A Gritsenko  Yu N Novikov  A V Shaposhnikov  H Wong  G M Zhidomirov
Institution:(1) Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences, Novosibirsk, 630090, Russia;(2) Department of Electronic Engineering, Hong Kong, China;(3) Institute of Catalysis, Siberian Branch, Russian Academy of Sciences, Novosibirsk, 630090, Russia
Abstract:The electronic structure and capturing properties of threefold coordinated silicon atoms (≡Si·) and the Si-Si bond in silicon nitride (Si3N4) were studied using the ab initio density functional theory. The results show that the previously proposed negative correlation energy (NCE) model is not applicable to Si3N4. The NCE model was proposed for interpreting the absence of the ESR signal for threefold coordinated silicon defects and suggested that an electron can transfer between two silicon defects. We proposed that the absence of this ESR signal is due to the creation of neutral diamagnetic Si-Si defects in Si3N4. This model offers the most fundamental theory for explaining the hole localization (memory) effect in silicon nitride.
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