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Dependence of space charge field and gain coefficient on the applied electric field in photorefractive materials
Authors:Ruchi Singh  M.K. Maurya  T.K. Yadav  D.P. Singh  R.A. Yadav
Affiliation:2. Research Institute of Environmental Medicine, Nagoya University, Nagoya, Japan;3. Nagoya University, Nagoya, Japan;1. Institute of Plasma Physics AS CR, Prague, Czech Republic;2. Széchenyi István University, Gy?r, Hungary;3. Wigner – RCP, HAS, Budapest, Hungary;4. Faculty of Mathematics and Physics, Charles University in Prague, Prague, Czech Republic;5. Department of Nuclear Techniques, Budapest University of Technology and Economics, Budapest, Hungary;6. Faculty of Nuclear Sciences and Physical Engineering, Czech Technical University in Prague, Prague, Czech Republic;1. Instituto de Física Rosario, Blvd. 27 de Febrero 210 bis, S2000EZP Rosario, Argentina;2. Electrónica e Informática, Instituto Nacional de Tecnología Industrial, P.O. Box B1650WAB, B1650KNA San Martín, Argentina;3. Centro Internacional Franco Argentino de Ciencias de la Información y de Sistemas, Blvd. 27 de Febrero 210 bis, S2000EZP Rosario, Argentina
Abstract:Intensity dependent space charge field and gain coefficient in the photorefractive medium due to the two interfering beams have been calculated by solving the material rate equations in presence of externally applied dc electric field. The gain coefficient has been studied with respect to variations in the input intensity, modulation depth, concentration ratio and normalized diffusion field in the absence and presence of the externally applied dc electric field. Space charge field has also been computed by varying the intensity ratio in the presence and absence of the externally applied dc electric field. It has been found that the rate of change of the space charge field with the normalized dc field decreases with the increasing intensity ratio for different values of the normalized diffusion field. It has also been found that the externally applied dc electric field has appreciable effect only when it is larger than the diffusion field.
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