占空比对微球a-C:H薄膜制备的影响

采用低压等离子体化学气相沉积方法（LPPCVD）,以反式二丁烯（T₂B）和氢气（H₂）为工作气体,利用间歇跳动模式在微球表面制备30 μm厚a-C:H涂层.利用原子力显微镜（AFM）和X射线照相技术对涂层表面形貌及壁厚均匀性进行表征,结果表明：随占空比减小,制备出的微球a-C:H薄膜表面粗糙度呈下降趋势,而壁厚均匀性随占空比的减小变化不明显；当占空比为1/5时,在直径为（280±50） μm 的聚乙烯醇-聚苯乙烯（PVA-PS）双层球表面制备出30 μm厚的a-C:H涂层,表面均方根粗糙度（RMS）低于30 nm；占空比为1/7时，不能维持微球的稳定跳动. 关键词： 微球 a-C:H薄膜 粗糙度 壁厚均匀性

Influence of duty ratio on the fabrication of a-C:H film on microshell

Using low-pressure plasma chemical vapor deposition （LPPCVD）, with trans-2-butene and hydrogen as the precursors, we have successfully deposited 30 μm CH coatings on microshells in intermittent bounce mode .The surface finish was measured by atomic force microscopy （AFM）, It was found that the surface finish was improved greatly with reduced duty ratio. When the duty ratio was 1/5, the surface roughness was less than 30 nm for the 30 μm thick a-C:H film. Uniformity of a-C: H films were measured by X-rayradiography. The results showed that the influence was little of duty ratio to the uniformity of a-C: H film. When the duty ratio was 1/7, microshells could not keep on bouncing.