Polymers in conventional and alternative lithography for the fabrication of nanostructures |
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| Authors: | Canet Acikgoz Mark A Hempenius Jurriaan Huskens G Julius Vancso[Author vitae] |
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| Institution: | aMaterials Science and Technology of Polymers, MESA+ Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500 AE Enschede, The Netherlands;bMolecular Nanofabrication Group, MESA+ Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500 AE Enschede, The Netherlands |
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| Abstract: | This review provides a survey of lithography techniques and the resist materials employed with these techniques. The first part focuses on the conventional lithography methods used to fabricate complex micro- and nano-structured surfaces. In the second part, emphasis is placed on patterning with unconventional lithography techniques such as printing, molding, and embossing, and on their development into viable, high-resolution patterning technologies. |
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| Keywords: | Polymer resists Conventional lithography Alternative lithography Patterning Colloidal assembly Nanoimprint lithography |
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