Synthesis, post-modification and self-assembled thin films of pentafluorostyrene containing block copolymers |
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Authors: | Maria Riedel Jan Stadermann Hartmut Komber Frank Simon Brigitte Voit |
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Affiliation: | Leibniz Institute of Polymer Research Dresden e.V., Hohe Str. 6, 01069 Dresden, Germany |
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Abstract: | Block copolymers consisting of a pentafluorostyrene (PFS) block and a hydrophilic block were synthesized by RAFT polymerisation. The hydrophilic blocks consist of methacrylate derivatives, 4-hydroxystyrene or 4-vinylpyridine monomers. The block copolymers were obtained with narrow molecular weight distributions and the molecular weights were in good agreement with the theoretical values. In addition, a model thiol was reacted with the PFS moieties of the block copolymers. This polymer–analogous reaction was performed under ambient conditions in high yields resulting quantitatively in para-substitution of the pentafluorophenyl rings. Finally, thin films consisting of block copolymers that showed strong phase-segregation behaviour and ordered nanostructured surfaces consisting of both blocks were obtained. |
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Keywords: | Block copolymers Click reactions Pentafluorostyrene, RAFT, Self-assembly behaviour Thin films |
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