| 深紫外光刻照明系统扩束单元设计 |
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| 引用本文： | 赵阳,巩岩,张巍. 深紫外光刻照明系统扩束单元设计[J]. 光学学报, 2011, 0(11) |
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| 作者姓名： | 赵阳 巩岩 张巍 |
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| 作者单位： | 中国科学院长春光学精密机械与物理研究所应用光学国家重点实验室; |
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| 基金项目： | 国家自然科学基金(40974110)资助课题 |
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| 摘 要： | 在曝光线宽为90nm的投影光刻机中,准分子激光光源发出的矩形截面光束,需要进行一维扩束,以获得光束整形单元所需的正方形截面分布。现有的这类扩束单元分别存在严重的相干散斑效应和严格的装调公差等不足。基于此,提出了多组元平行反射扩束镜组。通过求解各组元透射率值的线性方程组,得到若干种扩束单元结构,其中的四组元扩束单元每个组元只有一种透射率,有效降低了镀膜的工艺成本。分别从公差分析、系统透射率和出射光束均匀性等方面对各类扩束单元结构进行综合比较,并通过建模仿真,验证了设计的四组元扩束单元的散斑效应和装调公差灵敏度都明显降低,而且出射光束较均匀,有利于提高照明均匀性。
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| 关 键 词： | 几何光学 照明系统设计 一维扩束单元 公差分析 准分子激光光源 单一透射率 时间相干性 |
Design of Beam Expanding Unit for Illumination System of DUV Lithography |
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| Zhao Yang Gong Yan Zhang Wei. Design of Beam Expanding Unit for Illumination System of DUV Lithography[J]. Acta Optica Sinica, 2011, 0(11) |
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| Authors: | Zhao Yang Gong Yan Zhang Wei |
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| Affiliation: | Zhao Yang Gong Yan Zhang Wei(State Key Laboratory of Applied Optics,Changchun Institute of Optics,Fine Mechanics and Physics,Chinese Academy of Sciences,Changchun,Jilin 130033,China) |
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| Abstract: | The excimer laser beam is needed to be expanded in one dimension to meet the requirement of square cross-section distribution for beam shaping unit,because of the rectangular cross-section distribution characteristic of laser source for projected lithography which holds 90 nm exposure linewidth.The reported beam expanding units have the deficiencies of serious speckle effect of coherence and the strict tolerance to alignment.A kind of multi-component parallel reflective expander is proposed aiming at the sh... |
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| Keywords: | geometric optics illumination-system design one-dimensional beam expanding unit tolerance analysis excimer laser source single transmissivity temporal coherence |
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