157-nm laser micromachining of N-BK7 glass and replication for microcontact printing |
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Authors: | P.E. Dyer S.M. Maswadi C.D. Walton M. Ersoz P.D.I. Fletcher V.N. Paunov |
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Affiliation: | (1) Dept. of Physics, University of Hull, HU6 7RX Hull , UK;(2) Dept. of Chemistry, University of Hull, HU6 7RX Hull , UK |
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Abstract: | We report etch-rate and probe-beam-deflection studies of N-BK7 glass ablated using a 157-nm F2 laser. It is found that controllable material removal at the nanometre level is possible above an ablation threshold of 250 mJ cm-2. Contact mask printing shows well-defined features can be micromachined in this glass with sub-micron resolution capability. Micro-features produced in this way have been replicated by polydimethylsiloxane (PDMS) moulding and the stamps used to print arrays of fluorescent molecules with sub-micron fidelity. PACS 45.55.Lt; 52.38.Mf; 87.80.Mj; 42.70.Ce |
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