| KTN薄膜脉冲激光沉积过程的机理研究 |
| |
| 引用本文： | 李智华,张端明,陈中军,黄明涛,关丽,钟志成,李国栋. KTN薄膜脉冲激光沉积过程的机理研究[J]. 物理学报, 2001, 50(10): 1950-1955 |
| |
| 作者姓名： | 李智华 张端明 陈中军 黄明涛 关丽 钟志成 李国栋 |
| |
| 作者单位： | (1)华中科技大学(主校区)物理系,武汉430074; (2)襄樊学院物理系,襄樊441053 |
| |
| 基金项目： | 华中理工大学激光技术国家重点实验室;湖北省教育厅重大科研项目(批准号:2000B5002)资助的课题. |
| |
| 摘 要： | 根据能量平衡原理,导出了脉冲激光作用靶材的烧蚀率公式,并根据流体动力学理论,得出了脉冲激光产生的等离子体的空间运动特性方程,将靶材烧蚀率公式与等离子体空间动力学方程结合起来,根据实验研究了不同激光功率密度和波长对Kta0.65Nb0.35O3(KTN)薄膜沉积特性的影响,得到了一些有价值的结果,并对结果进行了详细的讨论,理论计算结果与实验大体符合.关键词：PLD技术烧蚀率等离子体KTN薄膜
|
| 关 键 词： | PLD技术 烧蚀率 等离子体 KTN薄膜 |
| 收稿时间： | 2000-10-27 |
| 修稿时间： | 2000-10-27 |
STUDY ON THE MECHANISM OF THE DEPOSITON PROCESS OF KTN THIN FILM BY PULSED LASER |
| |
| LI ZHI-HUA,ZHANG DUAN-MING,CHEN ZHONG-JUN,HUANG MING-TAO,GUAN LI,ZHONG ZHI-CHENG and LI GUO-DONG. STUDY ON THE MECHANISM OF THE DEPOSITON PROCESS OF KTN THIN FILM BY PULSED LASER[J]. Acta Physica Sinica, 2001, 50(10): 1950-1955 |
| |
| Authors: | LI ZHI-HUA ZHANG DUAN-MING CHEN ZHONG-JUN HUANG MING-TAO GUAN LI ZHONG ZHI-CHENG LI GUO-DONG |
| |
| Abstract: | According to energy balance consideration, the ablation ratio formula of target irradiated by pulsed laser is derived, and the spatial-characteristic equations of plasma generated by pulsed laser are obtained by using fluid dynamic theory. Combining the ablation ratio formula with the spatial-characteristic equations of plasma, the effects of different laser power density and wavelength on the deposition characteristics of Kta0.65Nb0.35O3(KTN) thin film are studied on the basis of our experiments. And many valuable results are obtained which have been discussed in detail. The calculated results are in agreement with experiments on the whole. |
| |
| Keywords: | PLD technology ablation ratio plasma KTN thin film |
| 本文献已被 CNKI 维普 万方数据 等数据库收录！ |
| 点击此处可从《物理学报》浏览原始摘要信息 |
|
点击此处可从《物理学报》下载免费的PDF全文 |
|
