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Electrical and interface characteristics of nanocrystalline n-Zn0.5Cd0.5S/p-Cu2S heterojunction structure prepared by dip coating
Authors:AAM Farag  M Abdel Rafea  Sara Gad  N Roushdy
Institution:1. Thin Film Laboratory, Physics Department, Faculty of Education, Ain Shams University, Heliopolis, Roxy, Cairo 11757, Egypt;2. Electronic Materials Department, Advanced Technology and New Materials Institute, City for Scientific Research and Technology Applications, P.O. 21934 New Borg El Arab City, Alexandria, Egypt
Abstract:Nanocrystalline of n-Zn0.5Cd0.5S/p-Cu2S heterojunctions were successfully prepared by the dip coating method. The surface morphology and the composition analysis were made by scanning electron microscopy (SEM) and energy dispersive x-ray (EDX) technique, respectively. Temperature dependent current–voltage characteristics of the heterojunctions were measured in the temperature range 300–400 K with a step of 25 K. The current–voltage (IV) characteristics exhibit electrical rectification behavior. The zero bias barrier height (ΦB0) and the ideality factor (n) are affected by temperature. Interface states at the n-Zn0.5Cd0.5S/p-Cu2S heterojunction play a crucial role in determining the electrical characteristics of the heterojunction. The high value of n can be ascribed to the presence of an interfacial layer. The energy distribution profile of the density of interface states (Nss) was extracted from the forward bias IV measurements using the width of the depletion region deduced from the capacitance -voltage characteristics at high frequency (1MHz).
Keywords:Nanostructures  Thin films  Dip coating  Electrical properties
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