Phase composition of thin silicon carbonitride films obtained by plazma endanced chemical vapour deposition using organosilicon compounds |
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| Authors: | Fainer N. I. Kosyakov V. I. |
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| Affiliation: | 1.Nikolaev Institute of Inorganic Chemistry, Russian Academy of Sciences, Novosibirsk, Russia
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| Abstract: | Journal of Structural Chemistry - High-temperature silicon carbonitride films are synthesized by plasma decomposition of gas mixtures of 1,1,1,3,3,3-hexamethyldisilazane (HMDS) (the synonym used by... |
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