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Electrochemical behaviour of Cu-NTA complexes |
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| Authors: | R M Krishnan and V S Muralidharan |
| Institution: | (1) Central Electrochemical Research Institute, 623006 Karaikudi, India |
| Abstract: | The deposition of copper was found to involve adsorbed monovalent copper which follows nonactivated Temkin isotherm. The presence of nitrilotriacetic acid stabilises it and the second electron transfer is slow. |
| Keywords: | Cyclic voltammetry copper complexes nitrilotriacetic acid |
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