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痕量铜的光度法分析进展
引用本文:张如意,张蕴光,李德有. 痕量铜的光度法分析进展[J]. 理化检验(化学分册), 2000, 36(10): 474-477
作者姓名:张如意  张蕴光  李德有
作者单位:1. 焦作工学院,焦作,454000
2. 漯河市环境监测站
3. 焦作化工技校
摘    要:综述了近年来测定痕量铜的光度法,包括常规光度法、流动注射光度法、导数光度法、析相光度法、催化动力学光度法、萃取光度法、荧光光度法、原子吸收光度法等。

关 键 词:铜 痕量分析 光度法 吸光光度法 导数光度法
修稿时间:1999-12-09

RECENT PROGRESS OF THE PHOTOMETRY OF TRACE AMOUNTS OF COPPER
Zhang Ruyi,Zhang Yunguang,Li Deyou. RECENT PROGRESS OF THE PHOTOMETRY OF TRACE AMOUNTS OF COPPER[J]. Physical Testing and Chemical Analysis Part B:Chemical Analgsis, 2000, 36(10): 474-477
Authors:Zhang Ruyi  Zhang Yunguang  Li Deyou
Affiliation:Zhang Ruyi;(Jiaozuo Institute of Engineering and Technology Jiaozuo 454000);Zhang Yunguang;(Henan Luohe Environmental Monitoring Station);Li Deyou;(Jiaozuo Technical School of Chemical Engineering)
Abstract:A review on the recent progress of photometric determination of trace amounts of copper is presented pertaining especially to the conventional photometry, FIA with photometric detection, derivative photometry, phase separation photometry, catalytic kinetic photometry, extraction photometry, fluorescence photometry and atomic absorption spectrometry and etc (with 56 references).
Keywords:Copper Trace analysis Photometry Review
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