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Phase aberration compensation of digital holographic microscopy based on least squares surface fitting
Authors:Jianglei Di   Jianlin Zhao   Weiwei Sun   Hongzhen Jiang  Xiaobo Yan
Affiliation:aInstitute of Optical Information Science and Technology, Shaanxi Key Laboratory of Optical Information Technology, School of Science, Northwestern Polytechnical University, Xi’an, Shaanxi 710072, China
Abstract:Digital holographic microscopy allows the numerical reconstruction of the complex wavefront of samples, especially biological samples such as living cells. In digital holographic microscopy, a microscope objective is introduced to improve the transverse resolution of the sample; however a phase aberration in the object wavefront is also brought along, which will affect the phase distribution of the reconstructed image. We propose here a numerical method to compensate for the phase aberration of thin transparent objects with a single hologram. The least squares surface fitting with points number less than the matrix of the original hologram is performed on the unwrapped phase distribution to remove the unwanted wavefront curvature. The proposed method is demonstrated with the samples of the cicada wings and epidermal cells of garlic, and the experimental results are consistent with that of the double exposure method.
Keywords:Digital holographic microscopy   Aberration compensation   Phase aberration   Least squares method   Surface fitting
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