Phase aberration compensation of digital holographic microscopy based on least squares surface fitting |
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Authors: | Jianglei Di Jianlin Zhao Weiwei Sun Hongzhen Jiang Xiaobo Yan |
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Affiliation: | aInstitute of Optical Information Science and Technology, Shaanxi Key Laboratory of Optical Information Technology, School of Science, Northwestern Polytechnical University, Xi’an, Shaanxi 710072, China |
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Abstract: | Digital holographic microscopy allows the numerical reconstruction of the complex wavefront of samples, especially biological samples such as living cells. In digital holographic microscopy, a microscope objective is introduced to improve the transverse resolution of the sample; however a phase aberration in the object wavefront is also brought along, which will affect the phase distribution of the reconstructed image. We propose here a numerical method to compensate for the phase aberration of thin transparent objects with a single hologram. The least squares surface fitting with points number less than the matrix of the original hologram is performed on the unwrapped phase distribution to remove the unwanted wavefront curvature. The proposed method is demonstrated with the samples of the cicada wings and epidermal cells of garlic, and the experimental results are consistent with that of the double exposure method. |
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Keywords: | Digital holographic microscopy Aberration compensation Phase aberration Least squares method Surface fitting |
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