Adsorption and desorption of toluene on nanoporous TiO2/SiO2 prepared by atomic layer deposition (ALD): influence of TiO2 thin film thickness and humidity

Adsorption and desorption of toluene on bare and TiO₂-coated silica with a mean pore size of 15 nm under dry and humid conditions were studied using toluene breakthrough curves and temperature programmed desorption (TPD) of toluene and CO₂. Two TiO₂/silica samples (either partially or fully covered with TiO₂) were prepared with 50 and 200 cycles of TiO₂ atomic layer deposition (ALD), respectively. The capacity of silica to adsorb toluene improved significantly with TiO₂-thin film coating under dry conditions. However, toluene desorption from the surface due to displacement by water was more pronounced for TiO₂-coated samples than bare samples under humid conditions. In TPD experiments, silica with a thinner TiO₂ film (50-ALD cycled) had the highest reactivity for toluene oxidation to CO₂ both in the absence and presence of water. Toluene adsorption and oxidation reactivity of silica can be controlled by modifying the silica surface with small amount of TiO₂ using ALD.