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Colloidal Lithography—The Art of Nanochemical Patterning
Authors:Gang Zhang Dr  Dayang Wang Dr
Institution:1. State Key Lab of Supramolecular Structure and Materials, College of Chemistry, Jilin University, 130012, Changchun (P.R. China);2. Max Planck Institute of Colloids and Interfaces, 14424 Potsdam (Germany), Fax: (+49)?331‐567‐9202
Abstract:Nanochemical printmaking : Colloidal lithography paves a powerful nanochemical way for patterning on planar substrates and microparticles. The feature size can easily be scaled down to 100 nm by reducing the diameter of the microspheres and the feature shape diversified by the crystalline structure of a colloidal crystal mask, the mask etching time, the incidence angle of the vapor beam, and the mask registry (the azimuth angle of the vapor beam).
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Keywords:colloids  lithography  nanostructures  patterning  self‐assembly
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