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部分相干分数域滤波改善光刻分辨率新方法
引用本文:杜惊雷,张怡霄,杨静,刘世杰,肖啸,郭永康,杜春雷.部分相干分数域滤波改善光刻分辨率新方法[J].光子学报,2003,32(7):892-895.
作者姓名:杜惊雷  张怡霄  杨静  刘世杰  肖啸  郭永康  杜春雷
作者单位:1. 四川大学物理系,成都,610064
2. 中国科学院光电技术研究所微细加工光学技术国家重点实验室,成都,610209
基金项目:国家自然科学基金 (6 990 70 0 3),微细加工光学技术国家重点实验室的资助
摘    要:基于部分相干成像和分数傅里叶变换,提出在投影光刻系统中,利用分数域滤波改善光刻图形质量的新方法.理论和模拟分析表明:在曝光成像系统中的适当位置加入分数域滤波器,能增强滤波操作的灵活性和效果,可更有效地改善光刻图形质量,为提高曝光系统的分辨力提供一种新的有效选择.

关 键 词:分数傅里叶域滤波  光学光刻  部分相干成像  瞳孔滤波
收稿时间:2002/9/3
修稿时间:2002年9月3日

New Filtering Approach on Partial Coherent Imaging System for Improving Photolithography Resolution
Du Jinglei,Zhang Yixiao,Yang Jing,Liu Shijie,Xiao Xiao,Guo Yongkang,Du Chunlei Physics Departemnet,Sichuan University,Chengdu,China State Key Lab of Optical Technology on Microfabrication,Chinese Academy of Sciences,Chengdu ,China.New Filtering Approach on Partial Coherent Imaging System for Improving Photolithography Resolution[J].Acta Photonica Sinica,2003,32(7):892-895.
Authors:Du Jinglei  Zhang Yixiao  Yang Jing  Liu Shijie  Xiao Xiao  Guo Yongkang  Du Chunlei Physics Departemnet  Sichuan University  Chengdu    China State Key Lab of Optical Technology on Microfabrication  Chinese Academy of Sciences  Chengdu  China
Institution:Du Jinglei1,Zhang Yixiao1,Yang Jing1,Liu Shijie1,Xiao Xiao1,Guo Yongkang1,Du Chunlei2 1 Physics Departemnet,Sichuan University,Chengdu,610064,China 2 State Key Lab of Optical Technology on Microfabrication,Chinese Academy of Sciences,Chengdu 610209,China
Abstract:Wavefront engineering technology is an effective method for enhancing photolithography resolution. In this paper, based on the theory of partial coherent imaging and fractional Fourier transform, a new idea using a fractional Fourier transform filter on projection system for improving photolithography pattern quality is proposed. Analysis on theory and simulation has shown that the new method is effective and flexible for improving photolithography pattern quality.
Keywords:Fractional Fourier filtering  Optical lithography  Partial coherent imaging  Pupil filtering
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