等离子体增强化学气相沉积法制备含氢类金刚石膜的紫外Raman光谱和X射线光电子能谱研究

利用脉冲辉光放电的方法,在硅片上采用不同的沉积工艺制备了含氢类金刚石膜层,并采用Raman光谱和X射线光电子能谱(XPS)对膜层进行表征.用Raman光谱仪在波长为325 nm的紫外光源的激励下观察膜层的键结构.紫外Raman光谱对含氢类金刚石膜是非常有用的,它能有效避免可见光Raman光谱测量时的荧光干扰,清晰地得到膜层的D峰和G峰.同时利用XPS分析得到膜层的sp3键含量,并与Raman光谱所得数据进行比较.通过Raman光谱和XPS分析可以发现,在紫外光源的激励下,膜层的G峰峰位向高频移方向移动,G峰峰位、I(D)/I(G),G峰半高宽和sp3键含量之间存在一定的关系.

UV Raman and XPS studies of hydrogenous diamond-like carbon films prepared by PECVD

The hydrogenous diamond-like carbon (DLC) films deposited on Si substrates using pulsed glow discharge method are investigated using Raman spectroscopy and X-ray photoelectron spectroscopy method. The UV Raman spectrum for excitation wavelength is 325 nm. UV Raman is particularly useful for hydrogenous DLC, as it gives clear measurements in the D and G peak spectral region even for highly hydrogenated samples, for which the visible Raman spectra are overshadowed by photoluminescence. The sp³ bonding of hydrogenous DLC film can be effectively studied by X-ray photoelectron spectroscopy method, and the data from the X-ray photoelectron spectroscopy method are compared with Raman results. It is found that G peak shows a shift to ward a higher wave under UV excitation. For the G peak, I(D)/I(G), G-FWHM and sp³, there exists a relationship among them.