首页 | 本学科首页   官方微博 | 高级检索  
     

N2微空心阴极放电特性及其阴极溅射的PIC/MC模拟
引用本文:张连珠,孟秀兰,张素,高书侠,赵国明. N2微空心阴极放电特性及其阴极溅射的PIC/MC模拟[J]. 物理学报, 2013, 62(7): 75201-075201. DOI: 10.7498/aps.62.075201
作者姓名:张连珠  孟秀兰  张素  高书侠  赵国明
作者单位:河北师范大学物理科学与信息工程学院, 石家庄 050024
基金项目:河北省自然科学基金 (批准号: A2012205072)资助的课题.
摘    要:采用两维PIC/MCC模型模拟了氮气微空心阴极放电以及轰击离子 (N2+,N+) 的钛阴极溅射. 主要计算了氮气微空心阴极放电离子 (N2+,N+) 及溅射原子Ti的行为分布, 并研究了溅射Ti 原子的热化过程. 结果表明: 在模拟条件下, 空心阴极效应是负辉区叠加的电子震荡; 在对应条件下, 微空心较传统空心放电两种离子 (N2+,N+) 密度均大两个量级, 两种离子的平均能量的分布及大小几乎相同; 在放电空间N+的密度约为N2+的1/6, 最大能量约大2倍; 在不同参数 (P, T, V)下, 轰击阴极内表面的氮离子(N2+,N+)的密度近似均匀, 其平均能量几乎相等; 从阴极溅射出的Ti原子的初始平均能量约6.8 eV, 离开阴极约0.15 mm处几乎完全被热化. 模拟结果为N2微空心阴极放电等离子体特性的认识提供了参考依据.关键词:微空心阴极放电PIC/MC模拟2等离子体')" href="#">N2等离子体

关 键 词:微空心阴极放电  PIC/MC模拟  N2等离子体
收稿时间:2012-07-30

Simulation of N2 microhollow cathode discharge and cathode sputtering by using a PIC/MC model
Zhang Lian-Zhu,Meng Xiu-Lan,Zhang Su,Gao Shu-Xia,Zhao Guo-Ming. Simulation of N2 microhollow cathode discharge and cathode sputtering by using a PIC/MC model[J]. Acta Physica Sinica, 2013, 62(7): 75201-075201. DOI: 10.7498/aps.62.075201
Authors:Zhang Lian-Zhu  Meng Xiu-Lan  Zhang Su  Gao Shu-Xia  Zhao Guo-Ming
Affiliation:College of Physics Science and Information Engineering, Hebei Normal University, Shijiazhuang 050024, China
Abstract:The nitrogen microhollow cathode discharge and Ti cathode sputtering, bombarded by ions (N2+, N+), have been studied using a two-dimensional PIC/MCC model. The behavior of ions (N2+, N+) and sputtered atom (Ti), and the thermalization process of the sputtered atoms in a nitrogen microhollow cathode discharge are simulated. The results show that hollow cathode effect is due to electron oscillations in the overlapping negative glow under our simulation condition. The densities of ions (N2+, N+) in the microhollow cathode discharge are two orders in magnitude greater than that in the conventional hollow cathode discharge; but the distributions and sizes of the mean energy of the ions (N2+, N+) are almost the same. The density of N2+ is fivefold as much as that of N+ in the microdischarge space; however, the maximum of mean energy of the latter is twice larger than the former. For various parameters (P, T, V), the densities of ions(N2+, N+) bombarding the cathode internal surface are almost uniformly distributed, and their mean energy are almost the same. When these atoms are 0.15 mm away from the cathode. The sputtered atoms are almost thermalized completely.
Keywords:microhollow cathode  PIC/MC simulation  N2 plasma
点击此处可从《物理学报》浏览原始摘要信息
点击此处可从《物理学报》下载免费的PDF全文
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号