Simulation and fabrication study of porous silicon photonic crystal |
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Authors: | Nalin H. Maniya Sanjaykumar R. PatelZ.V.P. Murthy |
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Affiliation: | Department of Chemical Engineering, Sardar Vallabhbhai National Institute of Technology, Surat 395 007, Gujarat, India |
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Abstract: | The present work reports design and fabrication of porous silicon based one-dimensional (1D) photonic crystal. Distributed Bragg reflector (DBR) is a 1D photonic crystal composed of multilayer stack of high and low refractive index layers. Design of porous silicon DBR is a complex one and requires appropriate control in optical parameters of its constituent layers. In order to design DBR, two porous silicon single layer samples were fabricated using current density of 10 and 50 mA/cm2. Optical characterization of single layer samples showed series of interference fringes. Reflective interferometric Fourier transform spectroscopy (RIFTS) method was employed to determine optical constants of porous silicon single layers. DBR simulation was carried out based on transfer matrix method. DBR was then fabricated using optical parameters obtained from RIFTS method. Reflection bandwidth of prepared DBR was found to be 216 nm, which is comparable to the simulated value of 203 nm. |
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Keywords: | Porous silicon Distributed Bragg reflector Reflective interferometric Fourier transform spectroscopy Electrochemical etching Transfer matrix method |
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