Research on mechanism for high light absorption of micro-structured silicon |
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Authors: | Guojin Feng Yu Wang Li Zhao |
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Affiliation: | 1. Spectrophotometry Laboratory, National Institute of Metrology, Beijing 100013, China;2. Department of Physics, Surface Physics National Key Laboratory, Fudan University, Shanghai 200433, China |
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Abstract: | The mechanism of the high light absorption of surface-microstructure silicon is discussed using optical simulation based on Monte Carlo method in this article. Calculation results indicate that the micro-structured surface and high refractive index of material are the two key factors that effectively reduce the reflection, especially transmittance, of the material instead of surface wave and sulfur. In addition, this shows clearly a development in direction for manufacturing new type detectors and increasing the efficiency of traditional detector effectively in the future. |
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Keywords: | Microstructure Femtosecond laser pulses Multi-reflect Detector |
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