Wrinkle patterns of anisotropic crystal films on viscoelastic substrates |
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Authors: | Se Hyuk Im |
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Affiliation: | Department of Aerospace Engineering and Engineering Mechanics, University of Texas, Austin, TX 78712, USA |
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Abstract: | This paper presents a nonlinear mathematical model for evolution of wrinkle patterns of an anisotropic crystal film on a viscoelastic substrate layer. The underlying mechanism of wrinkling has been generally understood as a stress-driven instability. Previously, theoretical studies on wrinkling have assumed isotropic elastic properties for the film. Motivated by recent experimental observations of ordered wrinkle patterns in single-crystal thin films, this paper develops a theoretical model coupling anisotropic elastic deformation of a crystal film with viscoelastic deformation of a thin substrate layer. A linear perturbation analysis is performed to predict the onset of wrinkling instability and the initial evolution kinetics. An energy minimization method is adopted to analyze wrinkle patterns in the equilibrium states. For a cubic crystal film under an equi-biaxial compression, orthogonally ordered wrinkle patterns are predicted in both the initial stage and the equilibrium state. This is confirmed by numerical simulations of evolving wrinkle patterns. By varying the residual stresses in the film, numerical simulations show that a variety of wrinkle patterns (e.g., orthogonal, parallel, zigzag, and checkerboard patterns) emerge as a result of the competition between material anisotropy and stress anisotropy. |
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Keywords: | Anisotropic material Pattern evolution Thin film Instability Viscoelasticity |
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