Preparation of new photosensitive TiO2 gel films using chemical additives including nitrogen and their patterning

TiO₂ gel films were prepared from titanium tetra-n-butoxide chemically modified with benzoylacetoanilide including nitrogen by the sol-gel method. The obtained gel film showed an absorption band, characteristic of the chelate ring, at 325 nm. The absorption band disappeared almost completely with UV-irradiation (2.7 J cm⁻²) using a high pressure mercury lamp. This indicates that the gel film exhibits photosensitivity. The decomposition rate of the chelate ring was the fastest in the photosensitive TiO₂ gel films which we have examined. Using the photosensitivity, fine patterns (about 5 μm) could be fabricated by UV-irradiation through a mask and leaching.