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Insertion of an Oxygen Atom between Tellurium Atoms upon Oxidation of a Diaryl Telluride with NOBF4 or (CF3SO2)2O/O2: Dicationic Bis[diaryltellurium(IV)] Oxide |
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| Authors: | Kenji Kobayashi Nobuo Deguchi Ernst Horn Naomichi Furukawa |
| Abstract: | NO and O 2 molecules are the source of the oxygen atom for dicationic µ-oxo(diaryltellurium) dimers 2 (X=BF4−, CF3SO3−), which form upon chemical oxidation of 1 with NOBF4 (method A) or (CF3SO2)2O/O2 method B, Eq. (a)]. The fate of the nitrogen atom of the oxidizing agent NOBF4 remains uncertain at this stage. |
| Keywords: | Insertions Nitrogen monoxide Oxidations Tellurium |