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About the Fluorine Chemistry in MCVD: The Influence of Fluorine Doping on SiO2 Deposition
Authors:Johannes Kirchhof  Peter Kleinert  Sonja Unger  A. Funke
Abstract:In the fabrication of quartz glass fibers for optical communication, fluorine doping gets increasing importance. In contrast to other dopants, fluorine influences the deposition of SiO2 in Modified Chemical Vapour Deposition. An equation is derived from considerations of equilibrium chemistry which yields the deposition efficiency of SiO2 as function of fluorine doping. It is compared with experimental results.
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