Growth Mechanism in Atomic Layer Epitaxy (II). A Model of the Growth Process of CdTe on CdTe (111) Substrates

A realistic model of CdTe growth by atomic layer epitaxy (ALE) has been proposed. This model is based on experimental studies concerning the isothermal re-evaporation rates of elemental Cd and Te deposits on the (lll)A and (lll)B surfaces of CdTe substrates, on a study of surface morphology and crystal structure of CdTe single crystal overlayers grown by ALE on CdTe(lll)B substrates under various crystallization conditions as well as on the existing theories related to the interaction of thermally activated atoms or molecules with hot solid surfaces. This model includes: (i) an existence of transition layers of both Cd and Te₂ species, intermediate between a chemisorbed and a bulk-like film, which create reaction zones 3–4 monolayers thick near the substrate surface, and (ii) partial re-evaporation of the first, chemisorbed monolayer of the deposited constituent elements.