摘 要: | As the critical dimensions in the semiconductor industryare shrinking, fast and accurate in-situ measurements ofprojection optics aberrations of lithographic tools becomeincreasingly necessary. Focus calibration using alignmentprocedure (FOCAL) [1-4] is an important technique usedfor self-calibration[5-8] of deep-ultraviolet (DUV) litho-graphic tools[9,10]. With this technique, imaging qualityparameters, such as best focus, image tilt, field curva-ture, and so on, can be measured accurately…
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